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- W2003577653 abstract "Abstract Amorphous tantalum oxide (TaOx) films have been formed by ArF excimer laser ablation of Ta2O5 in an O2/He atmosphere. The refractive indices of the films tend to decrease with an increase in the pressure of O2/He. At low pressures of O2/He below 12.6 Pa, the films are pin-hole free. At 32.6 Pa of O2/He, the deposits with larger sizes constitute the film. The surface image of the deposited films has been examined by atomic force microscopy." @default.
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- W2003577653 date "1995-08-01" @default.
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- W2003577653 title "Tantalum oxide film formation by excimer laser ablation" @default.
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- W2003577653 doi "https://doi.org/10.1016/0169-4332(95)00041-0" @default.
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