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- W2003658787 abstract "We have used a novel application of in situ high pressure mass spectrometry to monitor the tungsten chemical vapor deposition process. We observed the production of both and in ratios that vary with the inlet flow ratio. The and partial pressures were monitored over a tungsten coated wafer at 320°C as the inlet flow ratio was varied from a selective (0.25) to a nonselective (3.0) regime. We observed the product ratio to decrease dramatically at reactant ratios associated with the onset of loss of selectivity (1–1.5). The reaction products were sampled by means of a fused silica capillary that was introduced between the reacting tungsten coated wafer and a differentially pumped mass spectrometer. Gas phase reaction and thermodiffusion effects were also observed. These data provide insight concerning loss of selectivity mechanisms, and illustrate the potential of this mass spectrometric technique for real‐time in situ process control." @default.
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- W2003658787 date "1993-12-01" @default.
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- W2003658787 title "In Situ Monitoring of the Products from the SiH4 + WF 6 Tungsten Chemical Vapor Deposition Process by Micro‐Volume Mass Spectrometry" @default.
- W2003658787 doi "https://doi.org/10.1149/1.2221130" @default.
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