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- W2003676356 abstract "The infrared transmission characteristics of “combination oxides” consisting of initially growing a thin thermal SiO 2 layer (to achieve interface properties equivalent to thermal SiO 2 ) followed by sputter deposited SiO 2 , for bulk oxide growth (a low temperature deposition process), are studied to see the feasibility of substituting these oxides for dry thermal silicon oxides. In this study, “combination oxides”, grown on both p- and n-type silicon substrates were compared with dry thermal oxides of identical thicknesses. The infrared transmission results indicate that the vibration frequency ( v ) and full-width at half-maximum (FWHM) of dominant IR active mode of combination oxides differ only by ≈7 cm -1 from those of dry thermal oxides, thereby indicating a comparable stoichiometery of the former oxides to the latter." @default.
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- W2003676356 date "1994-05-01" @default.
- W2003676356 modified "2023-09-26" @default.
- W2003676356 title "Structural Characteristics of Combination Oxide Consisting of Dry Thermal SiO<sub>2</sub> and Sputtered SiO<sub>2</sub>" @default.
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- W2003676356 doi "https://doi.org/10.1143/jjap.33.2708" @default.
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