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• W2003758826 endingPage "132041" @default.
• W2003758826 startingPage "132041" @default.
• W2003758826 abstract "Unbalanced magnetron sputtering deposition of C-H films has been performed with various levels of negative substrate bias and with a fixed flow rate of hydrogen. Argon was used as a sputtering gas and formed the majority of the gas in the plasma. The effect of hydrogenation on the final concentration of trapped elements and their thermal stability with respect to hydrogen content is studied using ion beam analysis (IBA) techniques. The elemental concentrations of the films were measured in samples deposited on silicon substrates with a 3.3 MeV of He++ beam used to perform Rutherford Backscattering Spectroscopy (RBS), Non-Rutherford backscattering Spectroscopy (NRBS) and Elastic Recoil Detection Analysis (ERDA). Thermal stability with respect to trapped hydrogen in the film has been studied. As the films were heated in-situ in the vacuum using a o non-gassy button heater, hydrogen was found to be decreasing around 400° C." @default.
• W2003758826 created "2016-06-24" @default.
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• W2003758826 date "2009-11-01" @default.
• W2003758826 modified "2023-09-26" @default.
• W2003758826 title "Thermal stability of trapped hydrogen in amorphous carbon thin films on Si substrate using ion beam scattering" @default.
• W2003758826 cites W2003299486 @default.
• W2003758826 cites W2087329515 @default.
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• W2003758826 doi "https://doi.org/10.1088/1742-6596/194/13/132041" @default.
• W2003758826 hasPublicationYear "2009" @default.
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