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- W2003893006 abstract "Abstract The effect of oxygen content during sputtering on the leakage mechanism and the ferroelectric properties of BiFeO 3 with a sintering aid of CuO (CuO‐BFO) was investigated, where all thin films with (100) orientation were grown on SrRuO 3 /LaAlO 3 (100) substrates by radio frequency sputtering with an oxygen content of 0–40%. The ferroelectric properties in CuO‐BFO are tailored by changing the oxygen content during sputtering, indicating a small growth window. The Schottky emission dominates the leakage behavior regardless of oxygen content. The thin film with an oxygen content of ∼20% during sputtering has a higher remanent polarization of 2 P r ∼ 184.7 μC/cm 2 , due to its lower leakage current density and an improved phase purity. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)" @default.
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- W2003893006 date "2011-04-28" @default.
- W2003893006 modified "2023-10-06" @default.
- W2003893006 title "Effect of oxygen content during sputtering on the electrical properties of bismuth ferrite thin films" @default.
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- W2003893006 doi "https://doi.org/10.1002/pssr.201105129" @default.
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