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- W2004108775 abstract "Chemical amplification resists based on the reverse polarity change from a polar to a nonpolar state have been designed. The imaging mechanism relies on the pinacol-pinacolone rearrangement, wherein vic-diols (pinacols) are converted to ketones or aldehydes with photochemically generated acid as a catalyst. A polymeric pinacol has been synthesized and has demonstrated very efficient and clean rearrangement to provide negative images upon development with methanol. Small pinacol compounds have been also utilized in three-component, aqueous base developable, negative resist systems, where the rearrangement products inhibit the dissolution of the phenolic matrix resin in the exposed regions." @default.
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- W2004108775 date "1991-01-01" @default.
- W2004108775 modified "2023-10-03" @default.
- W2004108775 title "Recent progress in chemical amplification resists for excimer laser lithography: Revese polarity change via pinacol rearrangement." @default.
- W2004108775 doi "https://doi.org/10.2494/photopolymer.4.319" @default.
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