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- W2004132030 abstract "Technological considerations of direct wafer stepping are examined and the requirements of high volume V.L.S.I. production are identified. An advanced step-and-repeat alignment system is presented which fulfills, to a high degree, the criteria developed. Its high numerical aperture 10:1 reduction lens provides high resolution at high contrast level. A new designed illumination system supplies high exposure intensity at excellent uniformity. An automatic step-by-step alignment, focusing and leveling system compensates for irregular wafer topography and its changes during processing. By the capability to follow images already present on the wafer, it allows cross-matching with other exposure systems used for less critical manufacturing steps. The through-the-lens system of feedback-controlled alignment and true focus recognition eliminates from the machine geometric and optical changes such as those caused by temperature variation. Means for protecting both reticle and wafer against such environmental influences as dust, temperature and vibrations are provided. Equipment design permits high throughput for a large variety of die formats. High productivity is achieved by microprocessor-controlled functions and automatic handling as well as specially developed high speed displacement devices. The instrument presented promises new levels of productivity and working line widths while drawing on current knowledge in resist technology and wafer processing.© (1980) COPYRIGHT SPIE--The International Society for Optical Engineering. Downloading of the abstract is permitted for personal use only." @default.
- W2004132030 created "2016-06-24" @default.
- W2004132030 creator A5050700954 @default.
- W2004132030 creator A5052874983 @default.
- W2004132030 date "1980-09-05" @default.
- W2004132030 modified "2023-09-25" @default.
- W2004132030 title "<title>A New Step-By-Step Aligner For Very Large Scale Integration (VLSI) Production</title>" @default.
- W2004132030 doi "https://doi.org/10.1117/12.958618" @default.
- W2004132030 hasPublicationYear "1980" @default.
- W2004132030 type Work @default.
- W2004132030 sameAs 2004132030 @default.
- W2004132030 citedByCount "9" @default.
- W2004132030 crossrefType "proceedings-article" @default.
- W2004132030 hasAuthorship W2004132030A5050700954 @default.
- W2004132030 hasAuthorship W2004132030A5052874983 @default.
- W2004132030 hasConcept C119599485 @default.
- W2004132030 hasConcept C120665830 @default.
- W2004132030 hasConcept C121332964 @default.
- W2004132030 hasConcept C127413603 @default.
- W2004132030 hasConcept C146617872 @default.
- W2004132030 hasConcept C14737013 @default.
- W2004132030 hasConcept C151857401 @default.
- W2004132030 hasConcept C15336307 @default.
- W2004132030 hasConcept C157764524 @default.
- W2004132030 hasConcept C159985019 @default.
- W2004132030 hasConcept C160671074 @default.
- W2004132030 hasConcept C192562407 @default.
- W2004132030 hasConcept C24326235 @default.
- W2004132030 hasConcept C2779227376 @default.
- W2004132030 hasConcept C41008148 @default.
- W2004132030 hasConcept C53524968 @default.
- W2004132030 hasConcept C555944384 @default.
- W2004132030 hasConcept C76155785 @default.
- W2004132030 hasConcept C78762247 @default.
- W2004132030 hasConceptScore W2004132030C119599485 @default.
- W2004132030 hasConceptScore W2004132030C120665830 @default.
- W2004132030 hasConceptScore W2004132030C121332964 @default.
- W2004132030 hasConceptScore W2004132030C127413603 @default.
- W2004132030 hasConceptScore W2004132030C146617872 @default.
- W2004132030 hasConceptScore W2004132030C14737013 @default.
- W2004132030 hasConceptScore W2004132030C151857401 @default.
- W2004132030 hasConceptScore W2004132030C15336307 @default.
- W2004132030 hasConceptScore W2004132030C157764524 @default.
- W2004132030 hasConceptScore W2004132030C159985019 @default.
- W2004132030 hasConceptScore W2004132030C160671074 @default.
- W2004132030 hasConceptScore W2004132030C192562407 @default.
- W2004132030 hasConceptScore W2004132030C24326235 @default.
- W2004132030 hasConceptScore W2004132030C2779227376 @default.
- W2004132030 hasConceptScore W2004132030C41008148 @default.
- W2004132030 hasConceptScore W2004132030C53524968 @default.
- W2004132030 hasConceptScore W2004132030C555944384 @default.
- W2004132030 hasConceptScore W2004132030C76155785 @default.
- W2004132030 hasConceptScore W2004132030C78762247 @default.
- W2004132030 hasLocation W20041320301 @default.
- W2004132030 hasOpenAccess W2004132030 @default.
- W2004132030 hasPrimaryLocation W20041320301 @default.
- W2004132030 hasRelatedWork W1972280955 @default.
- W2004132030 hasRelatedWork W1972802460 @default.
- W2004132030 hasRelatedWork W1976102620 @default.
- W2004132030 hasRelatedWork W1976546659 @default.
- W2004132030 hasRelatedWork W1985047201 @default.
- W2004132030 hasRelatedWork W1985752146 @default.
- W2004132030 hasRelatedWork W2005015961 @default.
- W2004132030 hasRelatedWork W2014153841 @default.
- W2004132030 hasRelatedWork W2016017403 @default.
- W2004132030 hasRelatedWork W2026414892 @default.
- W2004132030 hasRelatedWork W2035809398 @default.
- W2004132030 hasRelatedWork W2047203055 @default.
- W2004132030 hasRelatedWork W2049176455 @default.
- W2004132030 hasRelatedWork W2058802162 @default.
- W2004132030 hasRelatedWork W2077104778 @default.
- W2004132030 hasRelatedWork W2146121164 @default.
- W2004132030 hasRelatedWork W2904009283 @default.
- W2004132030 hasRelatedWork W2990466144 @default.
- W2004132030 hasRelatedWork W50759852 @default.
- W2004132030 hasRelatedWork W2258802912 @default.
- W2004132030 isParatext "false" @default.
- W2004132030 isRetracted "false" @default.
- W2004132030 magId "2004132030" @default.
- W2004132030 workType "article" @default.