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- W2004147446 abstract "We show that novel thickness-dependent film conductance measurements, taken in situ during deposition of NiO/Co/Cu/Co spin valves and compared with thickness-dependent microstructural characterization, indicate a qualitative failure of widely accepted semiclassical free-electron models of giant magnetoresistance (GMR). Both in situ Auger electron spectroscopy covering experiments and ex situ x-ray diffraction measurements of peak intensity for Co/Cu/Co films indicate that the defect concentration does not vary noticeably as a function of thickness. The microstructural measurements suggest that the bulk scattering parameters ρ and λ should be considered to be constant within each layer, and that the surface scattering parameter p does not change between layers. Under these constraints, it becomes difficult to fit even qualitatively the highly asymmetric scattering behavior measured during the formation of Co/Cu vs Cu/Co interfaces. Calculations incorporating realistic band structure resolve the observed inconsistency between free-electron model calculations and experiment. The asymmetry in scattering is understood here to arise simply from the higher density of unfilled d states in Co compared with Cu." @default.
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- W2004147446 date "2000-05-01" @default.
- W2004147446 modified "2023-10-16" @default.
- W2004147446 title "Electronic scattering from Co/Cu interfaces: <i>In situ</i> measurement, comparison with microstructure, and failure of semiclassical free-electron models" @default.
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- W2004147446 doi "https://doi.org/10.1063/1.373289" @default.
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