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- W2004172976 abstract "A method for the formation of ultrafine hollow needles, microcylindrical and nano-wall structures on silicon substrates is reported. The fabrication of these ultrafine structures is possible through a combination of high-precision high aspect ratio vertical etching of silicon with a small angle vacuum deposition technique where nanometric walls are feasible. These structures can be used as the media to transfer gas and liquid through their tiny holes. In addition, the structure has been used to realize cavity-based capacitance inclination sensor suitable for small angle detection. A capacitance variation of 0.6 pF/degree of inclination has been obtained." @default.
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- W2004172976 date "2010-04-15" @default.
- W2004172976 modified "2023-09-27" @default.
- W2004172976 title "Ultrafine hollow needle formation on silicon" @default.
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