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- W2004175552 abstract "This paper describes an 8 Mb SRAM test chip that has been designed and fabricated in a 45 nm Silicon-On-Insulator (SOI) CMOS technology. The test chip comprises of sixteen 512 kb instances and is designed for use as the principal compilable one-port embedded-SRAM block in a 45 nm ASIC library. Challenges associated with SRAM cell design in SOI are overcome and resulted in a cell size of 0.315 mum <sup xmlns:mml=http://www.w3.org/1998/Math/MathML xmlns:xlink=http://www.w3.org/1999/xlink>2</sup> . The paper introduces two circuit techniques that address the AC and DC power consumption issues facing today's embedded-SRAMs. The first technique addresses AC power dissipation by utilizing a two-stage, body-contacted sensing scheme that, among other improvements, achieves a 68% improvement in read power under constant voltage and frequency compared to the previous generation macro . The second technique addresses the DC power consumption by introducing a single-device, header based dynamic leakage suppression scheme that reduces total macro leakage power by 38% with no wake-up cycle requirements." @default.
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- W2004175552 date "2009-01-01" @default.
- W2004175552 modified "2023-09-26" @default.
- W2004175552 title "An 8 Mb SRAM in 45 nm SOI Featuring a Two-Stage Sensing Scheme and Dynamic Power Management" @default.
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- W2004175552 doi "https://doi.org/10.1109/jssc.2008.2006433" @default.
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