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• W2004207917 abstract "1.0 and 2.0 MeV Ti ions have been implanted into silicon at different angles to study longitudinal and transverse distributions. The profiles of implanted Ti ions in Si at different angles were measured by secondary ion mass spectrometry (SIMS). The longitudinal and transverse moments are compared with the TRIM'90 Monte Carlo simulation. The results show that the longitudinal moments-projected range and range straggling-are consistent with calculated values within 13% and 15% respectively and the transverse moment is in agreement with the TRIM'90 simulation within 29%. The depth distribution obtained is also compared to Gaussian and Pearson functions." @default.
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• W2004207917 date "1995-06-14" @default.
• W2004207917 modified "2023-10-15" @default.
• W2004207917 title "Longitudinal and transverse moments of the distribution of MeV Ti ions implanted in Si measured by SIMS" @default.
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• W2004207917 doi "https://doi.org/10.1088/0022-3727/28/6/019" @default.
• W2004207917 hasPublicationYear "1995" @default.
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