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- W2004249143 abstract "A unified accurate 1/f noise model is developed for the strained-Si pMOSFETs with threading dislocations. With the fluctuations of carrier number and mobility taken into account simultaneously, the deep-submicrometre devices are investigated. The numerical results display that the area of the gate is key factor for the device's noise characteristics and that a critical gate area can be defined to evaluate the effects of the threading dislocations. And the 1/f noise induced by threading dislocation shows different characteristics at three conditions respectively. The unified model is also clearly reveal the physical mechanism of 1/f noise generated from threading dislocation definitely and available for deep-submicrometre device simulation, design and reliability applications." @default.
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- W2004249143 date "2007-07-01" @default.
- W2004249143 modified "2023-09-23" @default.
- W2004249143 title "A unified model for the 1/f noise induced by threading dislocation in strained-Si pMOSFETs" @default.
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- W2004249143 doi "https://doi.org/10.1109/icccas.2007.6251621" @default.
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