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- W2004253914 abstract "In this study, we performed a statistical analysis of 500 Ni Schottky diodes distributed across a 2-inch, n-type 4H-SiC wafer with an epilayer grown by chemical vapor deposition. A majority of the diodes displayed ideal thermionic emission when under forward bias, whereas some diodes showed ‘double-barrier’ characteristics with a ‘knee’ in the low-voltage log I vs. V plot. X-ray topography (XRT) and polarized light microscopy (PLM) revealed no correlations between screw dislocations and micropipes and the presence of double-barrier diodes. Depth resolved cathodoluminescence (DRCLS) indicated that certain deep-level states are associated with the observed electrical variations." @default.
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- W2004253914 date "2006-10-01" @default.
- W2004253914 modified "2023-09-23" @default.
- W2004253914 title "A Study of Inhomogeneous Schottky Diodes on n-Type 4H-SiC" @default.
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- W2004253914 doi "https://doi.org/10.4028/www.scientific.net/msf.527-529.911" @default.
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