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- W2004268977 abstract "Atomic force microscopy reveals scaling behaviour of silicon surfaces etched by plasma. The experimental results are compared with some theoretical models. It is shown that plasma-induced roughness is driven by a phenomenon that can be described by shadowing instabilities resulting in columnar microstructure growth. The same scaling properties as are predicted by a growth model are obtained." @default.
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- W2004268977 title "Roughness scaling of plasma-etched silicon surfaces" @default.
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- W2004268977 doi "https://doi.org/10.1088/0953-8984/10/1/004" @default.
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