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• W2004319053 startingPage "122701" @default.
• W2004319053 abstract "A vacuum–UV F 2 laser of 157 nm wavelength induced strong oxidation of 10-nm-thick Al thin films, forming transparent Al 2 O 3 on silica glass. The laser-induced modification occurred at the surface of Al thin films; consequently, the thickness of the formed Al 2 O 3 thin films increased linearly with increasing number of F 2 laser photons. The formation of equivalent-phase Al 2 O 3 thin films was confirmed by X-ray photoelectron spectroscopy. The oxidation reaction in the laser-induced modification of 10-nm-thick Al thin films was slower than that for 20- and 60-nm-thick Al thin films. Morphological changes leading to the crystallization of the Al 2 O 3 thin films were also observed when the thickness of Al thin films increased from 10 to 20 and 60 nm." @default.
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• W2004319053 date "2012-11-21" @default.
• W2004319053 modified "2023-10-01" @default.
• W2004319053 title "F₂-Laser-Induced Modification of Aluminum Thin Films into Transparent Aluminum Oxide" @default.
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• W2004319053 doi "https://doi.org/10.1143/jjap.51.122701" @default.
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