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• W2004454489 abstract "This paper treats the electrodynamic screening by the substrate of the van der Waals interaction between adsorbed particles. The free-space interaction is modified by a perturbation $ensuremath{Delta}V$, which describes the effect of the substrate. The McLachlan expression for $ensuremath{Delta}V$ is evaluated for the cases of Ne, Ar, Kr, Xe, and C${mathrm{H}}_{4}$ adsorbed on graphite basal planes, and a potential energy between adsorbed molecules (atoms) is calculated. The main effect is a reduction in well depth of 15-20% from the free-space values. Experimental data are semiquantitatively consistent with these potentials. Discussion of the results and their implications is given." @default.
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• W2004454489 date "1983-01-15" @default.
• W2004454489 modified "2023-09-24" @default.
• W2004454489 title "Substrate screening of the interaction between adsorbed atoms and molecules: Ne, Ar, Kr, Xe, and CH4on graphite" @default.
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• W2004454489 doi "https://doi.org/10.1103/physrevb.27.1314" @default.
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