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• W2004508952 abstract "Abstract We discuss the application of the particle-induced X-ray emission method with low energy protons (200–500 keV) to the measurement of the thickness and stoichiometry of nitride hard coatings (TiN, Ni3N). In particular we consider the accuracy in film thickness to be achieved in comparison with Rutherford backscattering spectrometry. Furthermore, we deduce sputtering yields of these layers caused by 0.25–1.0 MeV xenon ion irradiation. As in our previous analyses of krypton-irradiated TiN films, we find rather good agreement with the predictions of the Sigmund-Winterbon theory for films exceeding 30 nm and over the full xenon energy range." @default.
• W2004508952 created "2016-06-24" @default.
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• W2004508952 date "1991-08-01" @default.
• W2004508952 modified "2023-09-27" @default.
• W2004508952 title "Particle-induced X-ray emission analysis of xenon-irradiated nitride coatings" @default.
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• W2004508952 doi "https://doi.org/10.1016/0040-6090(91)90143-l" @default.
• W2004508952 hasPublicationYear "1991" @default.
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