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- W2004604610 abstract "The main factors influencing substrate temperature such as ion bombardment, heat radiation, and heat conductivity are analyzed for Pulsed-Bias Arc Ion Plating (PBAIP). The wave profile of the pulsed bias voltage, varying from -1000 to 0 V, is basically rectangle. This characteristic periodic energy input has an average energy density being equal to the product of that of the DC Arc Ion Plating (DCAIP) and the duty cycle in PBAIP. A temperature model based on energy conservation for the substrate temperature is thus established, which incorporates input ion power, heat radiation and heat conductivity. Experiments are also conducted to verify the calculation. (c) 2004 Elsevier B.V. All rights reserved." @default.
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- W2004604610 date "2005-05-01" @default.
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- W2004604610 title "Substrate temperature calculation for pulsed bias arc ion plating" @default.
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- W2004604610 doi "https://doi.org/10.1016/j.surfcoat.2004.07.074" @default.
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