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- W2004672038 abstract "Over the past decade Pulsed Laser Deposition (PLD) has become a routine laboratory tool with which to grow a wide variety of complex chemical compounds. A recent review of the literature has shown that over 275 different compounds have been deposited with this unique Physical Vapor Deposition (PVD) process [1]. Also, recent reports have shown that this process can be used to grow uniform films over substrates up to 200 mm (8 inch) diameter in size with growth rates compatible with competing PVD techniques [2,3]. However, PLD has several drawbacks which need to be adequately addressed before it can become a standard production tool. One of the main problems confronting laser-deposition is that there is little infrastructure or standardization to support either laboratory or production process equipment. To date, it is estimated that over 95% of existing laser deposition systems are “home-built” with each laboratory designing its own unique system. Thus, target-substrate distance, angle of incidence for the laser, optical train, focused spot size, target size, and rotation speed, etc. are all variables. This home-grown phenomena has led to film results which are at times difficult to reproduce on machines with different geometry. Furthermore, PLD has drawn on the infrastructure which presently exists for the semiconductor and electro-optics industry for tools such as vacuum gauging, mass flow controllers, and vacuum pumps. However, for production-oriented applications, this laser driven process will require other types of monitors and controls which are presently unavailable from the semiconductor industry. Areas which need to be addressed before PLD becomes more than a research tool include keeping the chamber's entrance window clean from film deposits, monitoring and controlling On-Target Laser Fluence (OTLF), measuring and controlling film deposition rate, and issues relating to target size and target resurfacing. This paper will attempt to look at some of the problems associated with the pulsed laser deposition process and consider some potential solutions." @default.
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- W2004672038 date "1997-01-01" @default.
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- W2004672038 title "Future trends for large-area pulsed laser deposition" @default.
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- W2004672038 doi "https://doi.org/10.1016/s0168-583x(96)00434-x" @default.
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