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- W2004693227 abstract "Silicon-titanium-doped a-C:H, deposited via plasma assisted chemical vapor deposition and its chemistry at the titanium carbide interface has been studied via X-ray photoelectron spectroscopy. In the a-C:H film, as well as at the interface, the carbide species TiSiC is formed. Thermal treatment of Si,Ti-a-C:H films on TiC causes an increase in TiSiC at the interface leading to a better adhesion performance." @default.
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- W2004693227 date "2004-01-01" @default.
- W2004693227 modified "2023-10-05" @default.
- W2004693227 title "On the chemistry at the Si,Ti-doped a-C:H/TiC interface" @default.
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- W2004693227 doi "https://doi.org/10.1016/s0040-6090(03)01324-5" @default.
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