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- W2004705718 abstract "Non-thickness-limited (NTL) growth of amidic films on tantalum is a remarkable recently reported phenomenon whereby anodic films can be formed on tantalum to high thickness due to a change in the film growth mechanism from the usual high-field type of process. The present work employs transmission electron microscopy to reveal the structure, composition, and morphology of an NTL-type film formed by anodizing tantalum at 1 A m 2 in 10 wt % dibasic potassium phosphate/glycerol electrolyte at 453 K. A relatively compact, amorphous layer of NTL-type film material, composed of essentially tantala, was formed above an inner layer of usual high-field-type tantala under the selected conditions of anodizing and drying of the electrolyte, The field for growth of NTL-type film material is ≤10 MV m -1 , compared with ∼400 MV m 1 for high-field growth. Thus, the thickness of the inner layer is approximately equal to the product of the formation ratio for usual anodic tantala and the final anodizing voltage." @default.
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- W2004705718 date "2002-01-01" @default.
- W2004705718 modified "2023-09-25" @default.
- W2004705718 title "Transmission Electron Microscopy of Non-Thickness-Limited Anodic Films on Tantalum" @default.
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- W2004705718 doi "https://doi.org/10.1149/1.1515279" @default.
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