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- W2004708052 abstract "Electron channeling patterns (ECP’s) were measured for Si and GaAs single crystals with thin polycrystal films or ion-damaged layers on the top surfaces. The intensity scans along channeling lines provide quantitative information on the above disordered layer thickness. We have derived a universal relation between the channeling line intensity and disordered layer thickness. This scaling law is independent of channeling planes and species of the single crystals and disordered layers." @default.
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- W2004708052 date "1988-10-17" @default.
- W2004708052 modified "2023-09-23" @default.
- W2004708052 title "Universal relation between electron channeling line intensity and thickness of disordered layers on single crystals" @default.
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- W2004708052 doi "https://doi.org/10.1063/1.99973" @default.
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