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• W2004770547 abstract "In this paper, we experimentally demonstrate and compare single-exposure multiple-beam interference lithography based on conventional laser interference, evanescent wave interference, and surface plasmon interference. The proposed two-beam and four-beam interference approaches are carried out theoretically and verified experimentally, employing the proposed configurations so as to realize the patterning of one- and two-dimensional periodic features on photoresists. A custom-fabricated grating is employed in the configuration in order to achieve two- and four-beam interference." @default.
• W2004770547 created "2016-06-24" @default.
• W2004770547 creator A5010034493 @default.
• W2004770547 creator A5014492011 @default.
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• W2004770547 date "2010-12-01" @default.
• W2004770547 modified "2023-09-25" @default.
• W2004770547 title "Interferometric lithography for nanoscale feature patterning: a comparative analysis between laser interference, evanescent wave interference, and surface plasmon interference" @default.
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• W2004770547 doi "https://doi.org/10.1364/ao.49.006710" @default.
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