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• W2004820512 abstract "For investigating arsenic self-diffusion, phosphorus (P) and antimony (Sb) were used. New P and Sb in-diffusion experiments show the same behavior as P and Sb interdiffusion experiments. This is in contradiction to results from the literature. By means of transmission electron microscopy we observed a phase transformation to polycrystalline GaAs1−xPx at the surface under experimental conditions similar to those described in the literature. This leads to a penetration depth much higher than for the P in-diffusion without this phase transformation. The new diffusion coefficients of the P and Sb in-diffusion above 900 °C are in the same range as the interdiffusion coefficients and self-diffusion coefficients from As-tracer diffusion. From this result we conclude that P and Sb have tracer properties for arsenic self-diffusion in GaAs. Measurements of the diffusion coefficients at different As-vapor pressures revealed that As self-diffusion is dominated by As self-interstitials. Furthermore, we performed annealing experiments on differently doped samples. There is no indication of a Fermi-level effect. Hence, As self-diffusion is governed mainly by neutral defects. Between 900 and 1100 °C, we obtain an Arrhenius expression DAsSD=75 exp(−4.4 eV/kT)cm2/s, which describes As self-diffusion. The P in-diffusion values below 900 °C show a weaker temperature dependence, which indicates a changeover to a different diffusion mechanism." @default.
• W2004820512 created "2016-06-24" @default.
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• W2004820512 date "2000-01-15" @default.
• W2004820512 modified "2023-09-23" @default.
• W2004820512 title "Phosphorus and antimony in GaAs as tracers for self-diffusion on the arsenic sublattice" @default.
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• W2004820512 doi "https://doi.org/10.1063/1.371929" @default.
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