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- W2004995718 abstract "The object of this study was to screen a group of metal oxides as possible candidates for use as semitransparent mask materials. For this study, all masks were prepared by d‐c reactive sputtering onto glass. The uv‐visible spectra for the entire group of oxide films were recorded. The spectral characteristics desired for a photomask are (i) transmission of less than 1% in the region below 404 nm (for masking), and (ii) transmission of greater than 30% at 589 nm (for the see‐through characteristic). Because of inferior spectral absorption properties, the following systems were eliminated from further consideration: lead oxide‐silicon oxide, lead oxide‐germanium oxide, copper oxide, copper oxide‐vanadium oxide, molybdenum oxide, chromium oxide, uranium oxide, mercury oxide, and zinc oxide. Those systems which satisfied the spectral requirements were: iron oxide, vanadium oxide, nickel oxide, iron oxide‐nickel oxide, and iron oxide‐vanadium oxide. These materials were then further evaluated to assure etchability in solvents compatible with photoresist processsing and resistance to abrasion. These latter two properties will be discussed in greater detail in a forthcoming article. Considering only sputtered films, the 10 m/o (mole per cent) iron oxide‐90 m/o vanadium oxide is the most promising material based on these additional requirements." @default.
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- W2004995718 date "1971-01-01" @default.
- W2004995718 modified "2023-09-25" @default.
- W2004995718 title "Materials for Use in a Durable Selectively Semitransparent Photomask" @default.
- W2004995718 doi "https://doi.org/10.1149/1.2408043" @default.
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