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• W2005062263 abstract "Nitrogen incorporation in InAsN epilayers grown by radio-frequency plasma-assisted molecular beam epitaxy was investigated as a function of growth conditions. Reduced growth rate, growth temperature, and arsenic flux significantly enhance the nitrogen incorporation. Optimal growth conditions allowed us to obtain high quality InAsN with nitrogen composition of up to 2.5%. The epilayers exhibit intense 4K photoluminescence (PL) with double-peak features, which were attributed to free carrier recombination and localized carrier recombination. Strong room temperature PL emission up to a wavelength of 4.5μm is obtained." @default.
• W2005062263 created "2016-06-24" @default.
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• W2005062263 date "2008-03-15" @default.
• W2005062263 modified "2023-10-16" @default.
• W2005062263 title "Room temperature photoluminescence at 4.5μm from InAsN" @default.
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• W2005062263 doi "https://doi.org/10.1063/1.2896638" @default.
• W2005062263 hasPublicationYear "2008" @default.
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