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- W2005369151 abstract "Vinyl copolymers with high radiation degradation sensitivity have been synthesized by copolymerizing vinylidene chloride (VDC), CH2 = CCl2, with methyl methacrylate (MMA), methacrylonitrile, methyl α-chloroacrylate, and dimethyl itaconate using emulsion techniques. In addition, copolymers of methyl α-chloroacrylate with methyl methacrylate and poly(α-chloroaerylonitrile) were studied. Introduction of vinylidene chloride into methyl methacrylate polymers caused a sharp increase in Gs even at relatively low VDC incorporation. Upon 29 percent VDC incorporation, the Gs value increased from 1.3 (homopolymer of MMA) to 3.4. Gs was found to be a linear function of copolymer content for several systems, but Gx was not. At higher VDC levels, the increase in Gs was countered by increases in Gx. At lower VDC levels, Gx was suppressed below the values predicted by a linear Gx dependence on composition for such systems as VDC/MMA, MCA/MMA, and α-chloroacrylonitrile/MMA. The VDC/MMA co-polymer(29 percent VDC) gavea sensitivity of 4.0 × 10−5C/cm2 to electron beam exposure using the 0 percent unexposed resist thickness loss criterion and is 2–3 times more sensitive than PMMA. Poly(α-chloroacrylonitrile) is a negative resist with a sensitivity of 5 × 10−5 C/cm2 using one-micron line images for testing." @default.
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- W2005369151 date "1980-06-01" @default.
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- W2005369151 title "Radiation degradation behavior of chlorine-containing vinyl copolymers. Search for improved electron-beam resists" @default.
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- W2005369151 doi "https://doi.org/10.1002/pen.760200908" @default.
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