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- W2005374490 abstract "A new type of ion projector is proposed to structurize a wafer at a resolution below 200 nm reducing the typically used lithography steps to a large extent. Basically, this technique aims to project a mask onto a wafer using an ion optical lens system allowing a demagnification up to 1:50 for ions with energies between 100 keV and some MeV. The center piece of this device is a single magnetic lens consisting of a superconducting solenoid. The achievable lateral resolution depends on lens errors, stability of the stencil mask and straggling of the implanted ions. A variation of the implantation energy would allow three dimensional structurization." @default.
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- W2005374490 date "1992-03-01" @default.
- W2005374490 modified "2023-09-27" @default.
- W2005374490 title "Sub-0.25-μm ion projection lithography (IPL) in PMMA- and novolak-based resist materials (RAY-PF, RAY-PN, SAL-603)" @default.
- W2005374490 doi "https://doi.org/10.1016/0167-9317(92)90048-v" @default.
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