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• W2005405711 abstract "Niobium oxide (NbOx) films were deposited by pulsed dc magnetron sputtering at different total gas pressures and oxygen flow rates. Various film properties were characterized by X-ray photoelectron spectroscopy, atomic force microscopy, variable angle spectroscopic ellipsometry and four point probe. It was found that oxygen flow rates required for preparing NbO, NbO2 and Nb2O5 at a constant total pressure of 0.93 Pa were approximately 2, 4 and > 6 sccm, respectively. The results showed that the film properties, specifically composition can be significantly changed by the total gas pressure and the oxygen flow rate." @default.
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• W2005405711 date "2011-03-01" @default.
• W2005405711 modified "2023-09-26" @default.
• W2005405711 title "Growth, structure and properties of sputtered niobium oxide thin films" @default.
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• W2005405711 doi "https://doi.org/10.1016/j.tsf.2010.12.036" @default.
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