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• W2005514343 abstract "Abstract Over the past few years, a growing interest on covalent bonding of polydimethylsiloxane (PDMS) microfluidic devices to thermoplastic films has developed due to reduced costs, biocompatibility, and flexibility. The silane reagent, 3‐aminopropyltriethoxysilane (APTES) has been applied to create this bonding. Here, we report on the fabrication of replica PDMS micromixer devices from a silicon mold using soft lithography that is rapid, facile, and cost‐effective to manufacture. After replica molding, the PDMS micromixer devices were bonded to the APTES‐activated thermoplastic films of polyimide, polyethylene terephthalate, and polyethylene naphthalate. Characterization of these thermoplastic surfaces was analyzed by contact angle measurement, surface free energy, and X‐ray photoelectron spectroscopy. To demonstrate the functionality of this technology, we have analyzed the PDMS micromixers by a peel test, nonleakages, and mixing with the injection of inks, a surfactant, and varying pH solutions. To our knowledge, this is the first reported example in literature of the PDMS–APTES–thermoplastic films preparation that integrates a complex micromixer device. Here, we have established that the hydrophobicity of both sealed polymers required alteration in order for dispersion of a polar liquid in the mixing loops. The application of a polar solvent before injection can remedy this ill effect formulating a hydrophilic micromixer. These preliminary results demonstrate the feasibility of the fabrication technology, bonding technique, and application of the micromixer that, once optimized, can eventually integrate more components to formulate a lab‐on‐a‐chip with the fabrication of gold microelectrodes for biological analysis of blood or plasma. © 2012 Wiley Periodicals, Inc. J Polym Sci Part A: Polym Chem, 2013" @default.
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• W2005514343 date "2012-10-09" @default.
• W2005514343 modified "2023-10-18" @default.
• W2005514343 title "Polymer micromixers bonded to thermoplastic films combining soft-lithography with plasma and aptes treatment processes" @default.
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• W2005514343 doi "https://doi.org/10.1002/pola.26387" @default.
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