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- W2005606486 abstract "More than a decade ago the first results on plasma-based ion implantation were presented by groups in the U.S. and Australia in the metallurgical field, and by groups in Japan for semiconductor processing. In the meantime, this technology has found widespread interest and is nearing commercialization. In Europe, the first reports in the literature appeared in the beginning of the 1990s. The present review discusses the research and development in plasma-based ion implantation in Europe, both the historical development and the present status, including the development of apparatus and projects which have been carried out." @default.
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- W2005606486 title "Research and development in plasma-based ion implantation in Europe. I. Apparatus and projects" @default.
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- W2005606486 doi "https://doi.org/10.1116/1.590642" @default.
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