Matches in SemOpenAlex for { <https://semopenalex.org/work/W2005659591> ?p ?o ?g. }
Showing items 1 to 98 of
98
with 100 items per page.
- W2005659591 abstract "Fluorocarbon polymers and siloxane-based polymers have been identified as promising resist candidates for 157 nm material design because of their relatively high transparency at this wavelength. This paper reports our recent progress toward developing 157 nm resist materials based on the first of these two polymer systems. In addition to the 2-hydroxyhexafluoropropyl group, (alpha) -trifluoromethyl carboxylic acids have been identified as surprisingly transparent acidic functional groups. Polymers based on these groups have been prepared and preliminary imaging studies at 157 nm are described. 2-Trifluoromethyl-bicyclo[2,2,1] heptane-2-carboxylic acid methyl ester derived from methyl 2-(trifluoromethyl)acrylate was also prepared and gas-phase VUV measurements showed substantially improved transparency over norbornane. This appears to be a general characteristic of norbornane-bearing geminal electron-withdrawing substituents on the 2 carbon bridge. Unfortunately, neither the Ni<SUP>II</SUP> nor Pd<SUP>II</SUP> catalysts polymerize these transparent norbornene monomers by vinyl addition. However, several new approaches to incorporating these transparent monomers into functional polymers have been investigated. The first involved the synthesis of tricyclononene (TCN) monomers that move the bulky electron withdrawing groups further away from the site of addition. The hydrogenated geminally substituted TCN monomer still has far better transparency at 157 nm than norbornane. The second approach involved copolymerizing the norbornene monomers with carbon monoxide. The third approach involved free-radical polymerization of norbornene monomers with tetrafluoroethylene and/or other electron-deficient comonomers. All these approaches provided new materials with encouraging absorbance at 157 nm. The lithographic performance of some of these polymers is discussed." @default.
- W2005659591 created "2016-06-24" @default.
- W2005659591 creator A5002152167 @default.
- W2005659591 creator A5018501536 @default.
- W2005659591 creator A5021479143 @default.
- W2005659591 creator A5021976188 @default.
- W2005659591 creator A5027381116 @default.
- W2005659591 creator A5031652578 @default.
- W2005659591 creator A5039797033 @default.
- W2005659591 creator A5053863787 @default.
- W2005659591 creator A5056595843 @default.
- W2005659591 creator A5059981404 @default.
- W2005659591 creator A5070535511 @default.
- W2005659591 creator A5078597191 @default.
- W2005659591 creator A5081755546 @default.
- W2005659591 creator A5085188205 @default.
- W2005659591 creator A5088627228 @default.
- W2005659591 date "2001-08-24" @default.
- W2005659591 modified "2023-10-10" @default.
- W2005659591 title "Resist materials for 157-nm microlithography: an update" @default.
- W2005659591 cites W2921404246 @default.
- W2005659591 doi "https://doi.org/10.1117/12.436870" @default.
- W2005659591 hasPublicationYear "2001" @default.
- W2005659591 type Work @default.
- W2005659591 sameAs 2005659591 @default.
- W2005659591 citedByCount "20" @default.
- W2005659591 countsByYear W20056595912013 @default.
- W2005659591 crossrefType "proceedings-article" @default.
- W2005659591 hasAuthorship W2005659591A5002152167 @default.
- W2005659591 hasAuthorship W2005659591A5018501536 @default.
- W2005659591 hasAuthorship W2005659591A5021479143 @default.
- W2005659591 hasAuthorship W2005659591A5021976188 @default.
- W2005659591 hasAuthorship W2005659591A5027381116 @default.
- W2005659591 hasAuthorship W2005659591A5031652578 @default.
- W2005659591 hasAuthorship W2005659591A5039797033 @default.
- W2005659591 hasAuthorship W2005659591A5053863787 @default.
- W2005659591 hasAuthorship W2005659591A5056595843 @default.
- W2005659591 hasAuthorship W2005659591A5059981404 @default.
- W2005659591 hasAuthorship W2005659591A5070535511 @default.
- W2005659591 hasAuthorship W2005659591A5078597191 @default.
- W2005659591 hasAuthorship W2005659591A5081755546 @default.
- W2005659591 hasAuthorship W2005659591A5085188205 @default.
- W2005659591 hasAuthorship W2005659591A5088627228 @default.
- W2005659591 hasBestOaLocation W20056595912 @default.
- W2005659591 hasConcept C153914509 @default.
- W2005659591 hasConcept C15920480 @default.
- W2005659591 hasConcept C159985019 @default.
- W2005659591 hasConcept C166940927 @default.
- W2005659591 hasConcept C174499055 @default.
- W2005659591 hasConcept C178790620 @default.
- W2005659591 hasConcept C185592680 @default.
- W2005659591 hasConcept C188027245 @default.
- W2005659591 hasConcept C192562407 @default.
- W2005659591 hasConcept C2776442012 @default.
- W2005659591 hasConcept C2778328087 @default.
- W2005659591 hasConcept C2779578285 @default.
- W2005659591 hasConcept C2780263894 @default.
- W2005659591 hasConcept C2780547246 @default.
- W2005659591 hasConcept C2780795484 @default.
- W2005659591 hasConcept C44228677 @default.
- W2005659591 hasConcept C521977710 @default.
- W2005659591 hasConcept C75473681 @default.
- W2005659591 hasConceptScore W2005659591C153914509 @default.
- W2005659591 hasConceptScore W2005659591C15920480 @default.
- W2005659591 hasConceptScore W2005659591C159985019 @default.
- W2005659591 hasConceptScore W2005659591C166940927 @default.
- W2005659591 hasConceptScore W2005659591C174499055 @default.
- W2005659591 hasConceptScore W2005659591C178790620 @default.
- W2005659591 hasConceptScore W2005659591C185592680 @default.
- W2005659591 hasConceptScore W2005659591C188027245 @default.
- W2005659591 hasConceptScore W2005659591C192562407 @default.
- W2005659591 hasConceptScore W2005659591C2776442012 @default.
- W2005659591 hasConceptScore W2005659591C2778328087 @default.
- W2005659591 hasConceptScore W2005659591C2779578285 @default.
- W2005659591 hasConceptScore W2005659591C2780263894 @default.
- W2005659591 hasConceptScore W2005659591C2780547246 @default.
- W2005659591 hasConceptScore W2005659591C2780795484 @default.
- W2005659591 hasConceptScore W2005659591C44228677 @default.
- W2005659591 hasConceptScore W2005659591C521977710 @default.
- W2005659591 hasConceptScore W2005659591C75473681 @default.
- W2005659591 hasLocation W20056595911 @default.
- W2005659591 hasLocation W20056595912 @default.
- W2005659591 hasOpenAccess W2005659591 @default.
- W2005659591 hasPrimaryLocation W20056595911 @default.
- W2005659591 hasRelatedWork W1975106166 @default.
- W2005659591 hasRelatedWork W1977210558 @default.
- W2005659591 hasRelatedWork W1997653599 @default.
- W2005659591 hasRelatedWork W1998561232 @default.
- W2005659591 hasRelatedWork W2040165481 @default.
- W2005659591 hasRelatedWork W2123140949 @default.
- W2005659591 hasRelatedWork W2376871002 @default.
- W2005659591 hasRelatedWork W2904756282 @default.
- W2005659591 hasRelatedWork W3081991159 @default.
- W2005659591 hasRelatedWork W4210464493 @default.
- W2005659591 isParatext "false" @default.
- W2005659591 isRetracted "false" @default.
- W2005659591 magId "2005659591" @default.
- W2005659591 workType "article" @default.