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• W2005710475 abstract "Dopant atoms segregate to SiO2/Si(001) interfaces and are deactivated there. This can cause problems in fabrication of submicron microelectronic devices. On the basis of ab initio calculations, we propose a mechanism for donor segregation and deactivation. We argue that donor species (P and As) are trapped as threefold-coordinated atoms at interface defect sites (dangling bonds and Si vacancies) and, most significantly, in form of dopant pairs at defect-free interfaces. This pairing will dominate when dopant concentration exceeds approximately 1019 cm−3." @default.
• W2005710475 created "2016-06-24" @default.
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• W2005710475 date "2000-07-01" @default.
• W2005710475 modified "2023-10-18" @default.
• W2005710475 title "Mechanism of dopant segregation to SiO2/Si(001) interfaces" @default.
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• W2005710475 doi "https://doi.org/10.1116/1.1306310" @default.
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