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- W2005723552 abstract "The electron field emission characteristics from undoped and sulfur- doped diamond films were investigated. Sulfur implantation was carried out by hot ion implantation into homoepitaxial diamond (100) films grown by chemical vapor deposition. The electron field emission properties of the specimens with and without sulfur implantation were measured and compared. Although their threshold field intensities remained almost unchanged, the emission current density increased with an increase in the amount of implanted sulfur. These results suggest that sulfur implantation introduced a number of defects at the surface area which, in turn, enlarged the effective field emission area." @default.
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- W2005723552 date "2002-06-15" @default.
- W2005723552 modified "2023-09-23" @default.
- W2005723552 title "Electron Field Emission from Sulfur Ion Implanted Homoepitaxial Diamond Films" @default.
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- W2005723552 doi "https://doi.org/10.1143/jjap.41.3924" @default.
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