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- W2005935296 abstract "Ion impact desorption of monolayer adsorbates on solid surfaces has been generally explained by three main terms: (I) reflection of direct knock-on adsorbate recoils, (II) knock-off by reflected projectiles and (III) knock-off by cascade collisions. In the case I, some fraction of the knock-on adsorbate recoils, not reflected, are implanted into the substrate. For evaluation of recoil-implantation effects on the adsorbate decay profile, mass balance equations for adsorbates at the top-surface and recoil-implanted in the sub-surface layers are proposed taking into account the desorption, recoil-implantation and collisional mixing with anisotropic effect. It is shown that the experimental decay profiles obtained by surface non-sensitive analysis techniques such as RBS are non-(bi-) exponential due to the recoil-implantation effect and that the analysis of the decay profiles provides the cross-sections for desorption and recoil-implantation. The recoil implantation cross-sections are compared with the theoretical recoil-production cross-sections. Finally, it is demonstrated that the recoil-implantation cross-section is used to characterize the well-defined ordered-adsorbates on monocrystalline surfaces, namely Si(111)√3 × √3-Au and -Ag surfaces." @default.
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- W2005935296 date "1993-05-01" @default.
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- W2005935296 title "Recoil implantation effects in ion impact desorption of monolayer adsorbates on solid surfaces" @default.
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- W2005935296 doi "https://doi.org/10.1016/0168-583x(93)95796-8" @default.
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