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• W2006193764 abstract "With the strong increase of mask complexity and associated price for each new technology node, mask less lithography represents more and more an interesting and complementary alternative for ASIC manufacturing especially in the fields of low volume and leading eadge technology applications. In the semiconductor business where prices and cycle time are constantly pressured, the capability and flexibility of the electron beam direct write offer an effective real cost and cycle time opportunity thanks to its high-resolution capability but also to its ability to print, modify or correct design everywhere in a circuit. This paper highlights application examples where the advantages of this lithography solution are demonstrated for advanced research and development application with the patterning of 45 nm SRAM and for the fast validation of architecture designs. This work confirms that mask less lithography can be transparently placed into production environment, in association with the golden optical lithography reference." @default.
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• W2006193764 date "2005-05-06" @default.
• W2006193764 modified "2023-10-16" @default.
• W2006193764 title "Electron beam direct write lithography flexibility for ASIC manufacturing: an opportunity for cost reduction (Keynote Paper)" @default.
• W2006193764 doi "https://doi.org/10.1117/12.601498" @default.
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