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• W2006224489 abstract "We report here plasma-induced formation of Ag nanostructures for surface-enhanced Raman scattering (SERS) applications. An array of uniform Ag patterned structures of 150 nm diameter was first fabricated on a silicon substrate with imprint lithography; then the substrate was further treated with an oxygen plasma to fracture the patterned structures into clusters of smaller, interconnected, closely packed Ag nanoparticles (20-60 nm) and redeposited Ag nanodots ( approximately 10 nm) between the clusters. The substrate thus formed had a uniform ultrahigh SERS enhancement factor (1010) over the entire substrate for 4-mercaptophenol molecules. By comparison, Au patterned structures fabricated with the same method did not undergo such a morphological change after the plasma treatment and showed no enhancement of Raman scattering." @default.
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• W2006224489 date "2007-03-27" @default.
• W2006224489 modified "2023-10-18" @default.
• W2006224489 title "Plasma-Induced Formation of Ag Nanodots for Ultra-High-Enhancement Surface-Enhanced Raman Scattering Substrates" @default.
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• W2006224489 doi "https://doi.org/10.1021/la063688n" @default.
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