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- W2006249624 abstract "By means of ultra-violet (UV) light with very small penetration depth, the dependence of surface crystallinity on the epitaxial Si film thickness in the (100)Si/MgO·Al2O3/SiO2/bulk-Si structure has been investigated. Since the reflected intensity of UV light is drastically reduced by surface roughness, it was found that the surface haze consisting of crystal defects revealed by Secco etching can be quantitatively measured. As a result, the surface crystallinity of silicon films in this structure depends strongly on the film thickness below 3 μm." @default.
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- W2006249624 date "1985-01-01" @default.
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- W2006249624 title "Characterization of surface layer in Si/MgO·Al2O3/SiO2/Si by ultra-violet reflection spectroscopy" @default.
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- W2006249624 doi "https://doi.org/10.1016/0022-0248(85)90076-4" @default.
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