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- W2006265687 abstract "We report on a new approach in analog photolithography for the manufacturing of optical elements with a continuous profile. It is based on a phase-only mask used in a mask aligner. The advantage of this new approach is that it is contact free, i.e. there is a gap between the mask and the substrate during the exposure. That allows a non-destructive mask lithography." @default.
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- W2006265687 date "2003-11-04" @default.
- W2006265687 modified "2023-09-23" @default.
- W2006265687 title "Analog proximity-photolithography with mask aligners for the manufacturing of micro-optical elements" @default.
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- W2006265687 doi "https://doi.org/10.1117/12.505751" @default.
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