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• W2006375542 abstract "Tetragonal-ZrO2 (t-ZrO2)-dispersed amorphous SiO2 composite films were prepared by laser chemical vapor deposition at high deposition rates of 40–300 μm h−1. Without SiO2 the films prepared at deposition temperatures of 869–1246 K contained monoclinic ZrO2. ZrO2 was stabilized in its tetragonal phase in an amorphous SiO2 matrix at deposition temperatures of 867–1170 K. The t-ZrO2 particle size decreased from 21 to 11 nm with increasing deposition temperature. In the amorphous SiO2 matrix, t-ZrO2 nanoparticles formed a network structure at lower deposition temperatures, whereas the t-ZrO2 nanoparticles were homogeneously dispersed at higher deposition temperatures." @default.
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• W2006375542 date "2015-09-01" @default.
• W2006375542 modified "2023-10-14" @default.
• W2006375542 title "High-speed deposition of tetragonal-ZrO2-dispersed SiO2 nanocomposite films by laser chemical vapor deposition" @default.
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• W2006375542 doi "https://doi.org/10.1016/j.matlet.2015.04.065" @default.
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