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• W2006469425 abstract "In this paper, we present results and discuss issues related to implementation of large scale circuits in extremely thin (ET) SOI CMOS for low power applications. We have demonstrated that we can fabricate low power (LP) CMOS with centered Vts and good Vt uniformity across wafer and wafer to wafer. Using this CMOS, we have fabricated low leakage and high performance ring oscillators (with delay ∼20% faster than the standard 28 nm LP bulk). We have also obtained perfect 2.25M SRAM arrays, functioning down to Vdd of 0.5V, and we have shown that a 10-level BEOL process has minimal impact on device stability." @default.
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• W2006469425 date "2011-12-01" @default.
• W2006469425 modified "2023-09-25" @default.
• W2006469425 title "Assessment of fully-depleted planar CMOS for low power complex circuit operation" @default.
• W2006469425 doi "https://doi.org/10.1109/iedm.2011.6131560" @default.
• W2006469425 hasPublicationYear "2011" @default.
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