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• W2006475304 abstract "We have developed a simulation model for examining the characteristics of the sputtering process of metal targets forming a face-centered cubic lattice. In our model the composition of the metal, the features of the lattice determining the cascade mixing and the interaction potentials can b changed. Also the mass and energy of the bombarding particles can be varied. The changes in the concentration profile for binary alloys can be determined by the registration of the composition change of the atomic layers. We can also analyse the dependence of the concentration changes in the topmost few layers on the masses of the component atoms and on their displacement energies. Besides the verification of the tendencies we have compared our calculations with experimental results for CuAu, CuNi and CuPd alloys. The experimental trends can be well explained with our model." @default.
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• W2006475304 date "1983-01-01" @default.
• W2006475304 modified "2023-09-26" @default.
• W2006475304 title "Computer simulation of the sputtering-induced composition change in CuAu, CuNi and CuPd alloys in the initial period of depth profiling" @default.
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• W2006475304 doi "https://doi.org/10.1016/0042-207x(83)90543-2" @default.
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