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- W2006536632 abstract "Block-copolymers are known to generate nano-scale microdomains by microphase-separation, if they are annealed at a temperature lower than their order-disorder transition temperatures. We tried to transfer microdomains onto substrates by only using the reactive-ion etching method, which is widely used in semiconductor manufacturing processes.Block-copolymers consisting of an aromatic polymer and an acrylic polymer were used since there is a big difference in the dry-etch resistance, and nanometer-scale dot patterns can be easily obtained on the substrates.Regarding the application of this nano-patterning technique, we demonstrated the first circumferential magnetic patterned media for hard disk, which were prepared on a 2.5-inch diameter glass plate." @default.
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- W2006536632 date "2002-01-01" @default.
- W2006536632 modified "2023-10-16" @default.
- W2006536632 title "Nano-Patterning for Patterned Media using Block-Copolymer." @default.
- W2006536632 doi "https://doi.org/10.2494/photopolymer.15.465" @default.
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