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- W2006799030 abstract "Abstract With the very high efficiency that has been achieved in silicon-based solar cells, the international technology roadmap for photovoltaics foresees a steady decrease in the thicknesses of such cells over the next decade. In this paper, we present an ultrathin interdigitated back-contacted silicon solar cell fabricated using 30-μm-thick Si substrates. In consideration of the special light-trapping and passivation requirements for ultrathin wafers, Si nanowire arrays coated with Al 2 O 3 were used to significantly reduce the reflectance in the visible region of the solar spectrum. The 15-nm-thick conformal Al 2 O 3 coating improved the effective minority carrier lifetime of the silicon nanowires and exhibited competitive passivation performance. Furthermore, the photovoltaic properties of the fabricated ultrathin solar cell were investigated and a relatively high conversion efficiency of 16.61% was determined for a thickness of 30 μm. The findings of this study confirm the feasibility of producing ultrathin silicon-based photovoltaic devices." @default.
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- W2006799030 date "2015-06-01" @default.
- W2006799030 modified "2023-09-23" @default.
- W2006799030 title "Ultrathin interdigitated back-contacted silicon solar cell with light-trapping structures of Si nanowire arrays" @default.
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- W2006799030 doi "https://doi.org/10.1016/j.solener.2015.03.034" @default.
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