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• W2006809378 abstract "Mixtures of hexamethyldisiloxane [HMDSiO, (CH3)3SiOSi(CH3)3] and oxygen are plasma polymerized at different oxygen pressures (P = 1.3–11.4 Pa) and a fixed monomer pressure (Pm = 2.6 Pa). The discharge power is kept at 100 W throughout the work. Nanometer-size holes in the deposited films are characterized by variable-energy positron annihilation lifetime spectroscopy (PALS). Additional information on the film composition and structure is obtained by X-ray photoelectron spectroscopy and IR absorption spectroscopy. The ortho-positronium lifetime τ3 and intensity I3 increase with the P up to 6.2 Pa and then decrease with the P. PALS measurements after annealing at 400°C show that films prepared at high oxygen pressure have a less stable structure than a film deposited at a lower oxygen pressure. These results are discussed in comparison with plasma deposition of pure HMDSiO, as are the possible effects of oxygen radicals on the film structure. © 2000 John Wiley & Sons, Inc. J Appl Polym Sci 79: 974–980, 2001" @default.
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• W2006809378 date "2000-01-01" @default.
• W2006809378 modified "2023-10-10" @default.
• W2006809378 title "Variable-energy positron lifetime study of silicon-oxide films plasma deposited from hexamethyldisiloxane and oxygen mixtures" @default.
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• W2006809378 doi "https://doi.org/10.1002/1097-4628(20010207)79:6<974::aid-app30>3.0.co;2-d" @default.
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