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- W2007057470 abstract "InP has been implanted with silicon to investigate the effect of implantation temperature on the postannealed electrical mobility. A significant improvement, by a factor of ∼2, occurs on implanting at 200 °C rather than at room temperature. Dislocations found after the room-temperature but not the 200 °C implants may account for the mobility differences." @default.
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- W2007057470 date "1979-07-15" @default.
- W2007057470 modified "2023-09-25" @default.
- W2007057470 title "Improved electrical mobilities from implanting InP at elevated temperatures" @default.
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- W2007057470 doi "https://doi.org/10.1063/1.91033" @default.
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