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- W2007122404 abstract "A semiconductor matrix has been developed using lithium-drifted diodes, and successfully applied to two-dimensional radiation localization. It is based on the construction of an array of individual detection regions upon a single silicon diode by orthogonal partitioning of the p and n regions. In the matrix formation, parallel grooves, 0.5 mm wide, were cut into both the p and n faces of a silicon diode, penetrating the intrinsic region. The measured resistance achieved across all grooves is at least 109 ohms, as a result of chemical etching and surface treatment. The isolation of the electrode regions bounded by the grooves on the p and n sides of the device permits row and column addressing of charge pulses from ionizing radiations. By interconnecting the rows and interconnecting the columns of a number of such units, larger areas can be monitored. A resolution of (3*3) mm has been achieved. The configuration is considered suitable for the construction of a gamma camera." @default.
- W2007122404 created "2016-06-24" @default.
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- W2007122404 date "1969-04-01" @default.
- W2007122404 modified "2023-09-26" @default.
- W2007122404 title "Semiconductor diode matrix for isotope localization" @default.
- W2007122404 cites W1969910337 @default.
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- W2007122404 doi "https://doi.org/10.1088/0031-9155/14/2/004" @default.
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