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- W2007183513 abstract "Present work provides a comprehensive study on Aluminum induced crystallization (AIC) of Hot Wire Chemical Vapour Deposited (HWCVD) a-Si:H. Different parameters, namely, layer sequence, annealing temperature and time, were studied to correlate their impact on the quality of nc-Si:H films obtained by AIC. Device quality nc-Si:H thin films at a very low temperature of 473 K were obtained for the layer sequence of substrate/a-Si:H/Al." @default.
- W2007183513 created "2016-06-24" @default.
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- W2007183513 date "2013-07-01" @default.
- W2007183513 modified "2023-10-16" @default.
- W2007183513 title "Low temperature aluminum induced crystallization of HWCVD deposited a-Si:H" @default.
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- W2007183513 doi "https://doi.org/10.1109/icanmeet.2013.6609307" @default.
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