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- W2007190901 abstract "The gettering of copper by keV implantation of germanium into silicon is investigated. Germanium is implanted at a fixed energy with varying doses into the front side of silicon samples. Copper is thermally evaporated on the backside of the samples and then annealed at 900 °C for 1 h and 10 h, respectively, to allow in-diffusion of the transition metal. Rutherford backscattering spectroscopy, secondary-ion-mass spectroscopy, and cross-section transmission electron microscopy are used to demonstrate that gettering of copper is achieved through stacking faults created by heavy dose germanium implantation and solid-phase epitaxy." @default.
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- W2007190901 date "1995-09-01" @default.
- W2007190901 modified "2023-10-02" @default.
- W2007190901 title "The gettering of copper by keV implantation of germanium into silicon" @default.
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- W2007190901 doi "https://doi.org/10.1063/1.360050" @default.
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