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• W2007234097 abstract "We report photomultiplication, M, and excess noise, F, measurements at 244nm and 325nm in two 4H-SiC separate absorption and multiplication region avalanche photodiodes (SAM-APDs). Sample A is a 4 x 4 array of 16 SAM-APDs. This structure possesses a relatively thin absorption layer resulting in more mixed injection, and consequently higher noise than sample B. The absorption layer of sample B does not deplete, so 244nm light results in >99% absorption outside the depletion region resulting in very low excess noise. Both structures exhibit very low dark currents and abrupt uniform breakdown at 194V and 624V for samples A and B respectively. Excess noise is treated using a local model [1]. The effective ratio of impact ionisation coefficients (keff) is approximately 0.007, this indicates a significant reduction in the electron impact ionisation coefficient, α, compared to prior work [2-5]. We conclude that the value of α will require modification if thick silicon carbide structures are to fit the local model for multiplication and excess noise." @default.
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• W2007234097 date "2010-04-01" @default.
• W2007234097 modified "2023-09-24" @default.
• W2007234097 title "Characterisation of Low Noise 4H-SiC Avalanche Photodiodes" @default.
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• W2007234097 doi "https://doi.org/10.4028/www.scientific.net/msf.645-648.1081" @default.
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